Pattern defect detection apparatus

Details Pattern defect detection apparatus Pattern defect detection apparatus

1995-11-28

1998-06-30

Boudreau, Leo

Image analysis

Applications

Manufacturing or product inspection

382141, 382173, 348129, G06K 900

Patent

active

057745749

ABSTRACT:
In a printed substrate inspection apparatus for dividing an inspection objective image into divided areas and comparing divided areas with a plurality of reference images which are included in a standard pattern image, an affect of a positional deviation of the inspection objective image is obviated. A size K of each inspection objective divided area is determined in such a manner that a difference between a positional deviation within each inspection objective divided area and a positional deviation of the inspection objective image does not exceed a quantity corresponding to 1 pixel. Further, a maximum shifting quantity M of the reference images with respect to each inspection objective divided area is set equal to or larger than a positional deviation maximum value of the inspection objective image. A positional deviation of the inspection objective image as a whole does not manifests itself as an inclination or a distortion within each inspection objective divided area. The plurality of reference images include images which correspond to images of the inspection objective divided areas. Hence, comparison inspection is accurate.

REFERENCES:
patent: 5146509 (1992-09-01), Hara et al.
patent: 5479537 (1995-12-01), Hamashima et al.
patent: 5537487 (1996-07-01), Miyajima et al.
patent: 5574800 (1996-11-01), Inoue et al.

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