Pattern configuration measuring apparatus

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250307, G01N 23225, H01J 3728

Patent

active

050292501

ABSTRACT:
A pattern configuration measuring method of and apparatus for measuring a cross sectional profile of a pattern (10) formed on a flat plane with a concave or convex structure having a taper portion (10a, 10b) on both sides thereof, by scanning a beam in a predetermined direction with a scanning electron microscope (1), detecting a secondary electron to acquire an image signal of the pattern, and processing the image signal. The column (1a) of the scanning electron microscope is set at an optional inclination angle relative to the flat plane formed with the pattern, a beam is scanned onto the pattern with the scanning electron microscope in the direction perpendicular to the longitudinal direction of the concave or convex structure, an output signal is acquired from the scanning electron microscope and image-processed to detect both the taper portions of the pattern and to calculate the dimension of the pattern, a beam is scanned onto the pattern with the scanning electron microscope in the direction parallel to the longitudinal direction of the concave or convex structure, and an output signal is acquired from the scanning electron microscope and image-processed to calculate the cross sectional profile of the pattern. The column of the scanning electron microscope may be set perpendicular to the flat plane, and the pattern to be measured is set at an optional inclination angle relative to the column axis of the scanning electron microscope.

REFERENCES:
patent: 4567364 (1986-01-01), Kano et al.
patent: 4725730 (1988-02-01), Kato et al.
Finnes, S. J. et al., "Nondestructive Slope/Thickness Measurement for Semiconductor Topology", IBM Technical Disclosure Bulletin, vol. 26, No. 1, Jun. 1983, pp. 189-190.
Suganuma, Tadao, "Measurement of Surface Topography Using SEM with Two Secondary Electron Detectors", 2339 Journal of Electron Microscopy, 34(1985), No. 4, Tokyo, Japan, pp. 328-337.
Hearle, J. W. S. et al., "The Use of the Scanning Electron Microscope", Pergamon Press Ltd., 1982, p. 65.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Pattern configuration measuring apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern configuration measuring apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern configuration measuring apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1254079

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.