Pattern coating material and pattern forming method

Details Pattern coating material and pattern forming method Pattern coating material and pattern forming method

2011-04-26

2011-04-26

Chu, John S (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S271100, C430S291000, C430S317000

Reexamination Certificate

active

07932013

ABSTRACT:
There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask.The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.

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International Search Report in connection with corresponding PCT application No. PCT/JP2006/312136, dated Sep. 12, 2006.

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