Pattern checking apparatus

Image analysis – Histogram processing – For setting a threshold

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356237, 356394, 382 34, G06K 900

Patent

active

046285318

ABSTRACT:
A pattern checking apparatus carries out the detection of candidate defects through a primary selection with a sensitivity high enough to detect any existing defect, and then carries out a detailed analysis by a controlling processor for a pattern including the periphery of the detected candidate defect through a secondary selection in which a candidate defect which is not a defect in a practical sense is removed from candidates, so that only real defects are detected.

REFERENCES:
patent: 3887762 (1975-06-01), Uno et al.
patent: 3905045 (1975-09-01), Nickel
patent: 4200861 (1980-04-01), Hubach et al.
patent: 4309691 (1982-01-01), Castleman
patent: 4345312 (1982-08-01), Yasuye et al.
patent: 4352125 (1982-09-01), Guth
Ejiri et al., "A Process for Detecting Defects in Complicated Patterns", 1973.
Adam Osborne, An Introduction to Microcomputers, 1980.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Pattern checking apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern checking apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern checking apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1390139

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.