Particulate reduction baffle with wafer catcher for chemical-vap

Details Particulate reduction baffle with wafer catcher for chemical-vap Particulate reduction baffle with wafer catcher for chemical-vap

1991-10-24

1994-06-21

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118725, 4272481, C23C 1600

Patent

active

053225678

ABSTRACT:
In an epitaxial reactor system using a vacuum pump which is connected to the reaction chamber by an exhaust line, particulate contaminants normally deposit in the exhaust line near its juncture with the reaction chamber. When the vacuum pump is isolated from the reaction chamber during a back-filling operation, these contaminants can be entrained in the currents of gas normally produced in the back-filling operation. A removable baffle device having the shape of a truncated cone and including a wafer catching device that holds a disk shaped particulate baffle member is placed in the exhaust line at its juncture with the reaction chamber to prevent these particles from re-entering the reaction chamber.

REFERENCES:
patent: 4282267 (1981-08-01), Kuyel
patent: 4583492 (1986-04-01), Cowher et al.
patent: 4834022 (1989-05-01), Mahawili
patent: 4838201 (1989-06-01), Fraas
patent: 4992044 (1991-02-01), Philipossian
patent: 5038711 (1991-08-01), Dan
patent: 5188672 (1993-02-01), Rinnovatore

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