Particle trap for electrostatic chuck

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

11119316

ABSTRACT:
Wafer supporting apparatus, including an electrostatic chuck for supporting the wafer. The apparatus further includes an electrostatic shield which is positioned in proximity to the chuck and the wafer, and a voltage source which is coupled to apply an electric field between the chuck and the wafer. The voltage source applies one or more potentials to the electrostatic shield so as to prevent penetration of particles to the wafer.

REFERENCES:
patent: 6169652 (2001-01-01), Klebanoff
patent: 6380546 (2002-04-01), Petrov et al.
patent: 6451176 (2002-09-01), Vernon et al.
patent: 6534775 (2003-03-01), Harrington et al.
patent: 6674075 (2004-01-01), Petrov et al.
patent: 6689930 (2004-02-01), Pang et al.
patent: 6825475 (2004-11-01), Petrov et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Particle trap for electrostatic chuck does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Particle trap for electrostatic chuck, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Particle trap for electrostatic chuck will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3922169

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.