Particle trap apparatus and methods

Gas separation: processes – Filtering

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Details

553851, 55490, 554901, 118715, 156345, 438905, 95283, B01D 4600

Patent

active

061172138

ABSTRACT:
A method for removing particulate matter from an exhaust stream, in which the exhaust stream is passed through a particle trap assembly. The trap assembly includes a particle trap having a trap inlet, a filter region located downstream from the trap inlet, and an upstream portion located upstream from the filter region. The cross-sectional area of the upstream portion is preferably at least as great as the cross-sectional area of the filter region. The particle trap may be operably coupled directly to a source of an exhaust stream via a connector unit. The trap assembly may include a heating unit for heating at least a portion of the trap assembly, and a bellows-like connector unit.

REFERENCES:
patent: 4252545 (1981-02-01), Haterkorn
patent: 4910042 (1990-03-01), Hokynar
patent: 5443644 (1995-08-01), Ozawa
patent: 5489446 (1996-02-01), Matsumoto
patent: 5536321 (1996-07-01), Olsen et al.
patent: 5571333 (1996-11-01), Kanaya
patent: 5584963 (1996-12-01), Takahashi
patent: 5607511 (1997-03-01), Meyerson
patent: 5788747 (1998-08-01), Horiuchi et al.
patent: 5819683 (1998-10-01), Ikeda et al.
patent: 5871813 (1999-02-01), Pham
patent: 5904757 (1999-05-01), Hayashi et al.
patent: 5914000 (1999-06-01), Takahashi
patent: 5928426 (1999-07-01), Aitchison
patent: 6015463 (2000-01-01), Cox

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