Fishing – trapping – and vermin destroying
Patent
1996-02-02
1997-02-18
Niebling, John
Fishing, trapping, and vermin destroying
437939, 356237, G01R 3126, H01L 2166
Patent
active
056041349
ABSTRACT:
Plasma reactors are used extensively in the manufacture of integrated circuits for the deposition and etching of thin films at low temperatures. Their range of operating temperatures and gas pressures make them highly susceptible to build-up of deposits on the inner surfaces of the reaction chamber which subsequently become dislodged by vibrations, stresses, and other aggravations and are dispersed within the system as particulates. The monitoring of particulate accumulation on wafers is conventionally done by subjecting a test wafer to a simulated operation within the tool under gas flow alone. Some types of plasma reactors incorporate oscillating gas dispersion housings in order to improve homogeneity of the gas mixture. The motion of these housings can induce significant particle displacement within the chamber. The correct monitoring procedure for these tools must therefore include the motion of the distribution housing in addition to the conventional procedures.
REFERENCES:
patent: 4778745 (1988-10-01), Leung
patent: 5233191 (1993-08-01), Noguchi et al.
patent: 5274434 (1993-12-01), Morioka et al.
Chang Kuan-Hui
Chu Po-Tao
Peng Tzu-Min
Yen Shin-Kuei
Dutton Brian K.
Niebling John
Saile George O.
Taiwan Semiconductor Manufacturing Company , Ltd.
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