Particle monitor system and method

Optics: measuring and testing – By particle light scattering – With photocell detection

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Details

356339, 359509, 359512, G01N 2100

Patent

active

050838652

ABSTRACT:
A particle monitor for a processing chamber exhaust line is disclosed which incorporates exhaust line heating, purge gas flow over surfaces such as optical windows in the exhaust gas line, and a thermally and electrically insulating particle monitor mounting arrangement. The features collectively protect the particle monitor from electrical disturbance and from the heated inlet and maintain the optical surfaces clean and free of depositions from the exhaust gas flow for an extended period. The arrangement also suppresses etching of the optical surfaces.

REFERENCES:
patent: 3495259 (1970-02-01), Rocholl et al.
patent: 3696230 (1972-10-01), Friedrich
patent: 3861198 (1975-01-01), Shea
patent: 4343552 (1982-08-01), Blades
patent: 4443072 (1984-04-01), Ballard
patent: 4738528 (1988-04-01), Craft
patent: 4786188 (1988-11-01), Myhre et al.
patent: 4836689 (1989-06-01), O'Brien et al.
patent: 4886356 (1989-12-01), Paradis

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