Measuring and testing – Testing of apparatus
Patent
1996-09-13
1998-07-07
Noland, Thomas P.
Measuring and testing
Testing of apparatus
73 37, 738655, G01N 1900, G01N 1502
Patent
active
057772452
ABSTRACT:
The system and method prepare a gas stream comprising particles at a known concentration using a particle disperser for moving particles from a reservoir of particles into a stream of flowing carrier gas. The electrostatic charges on the particles entrained in the carrier gas are then neutralized or otherwise altered, and the resulting particle-laden gas stream is then diluted to provide an acceptable particle concentration. The diluted gas stream is then split into a calibration stream and the desired output stream. The particles in the calibration stream are detected to provide an indication of the actual size distribution and concentration of particles in the output stream that is supplied to a process chamber being analyzed. Particles flowing out of the process chamber within a vacuum pumping system are detected, and the output particle size distribution and concentration are compared with the particle size distribution and concentration of the calibration stream in order to determine the particle transport characteristics of a process chamber, or to determine the number of particles lodged in the process chamber as a function of manufacturing process parameters such as pressure, flowrate, temperature, process chamber geometry, particle size, particle charge, and gas composition.
REFERENCES:
patent: 4220499 (1980-09-01), Hughes, Jr. et al.
patent: 4225385 (1980-09-01), Hughes, Jr. et al.
patent: 4764758 (1988-08-01), Skala
patent: 4967608 (1990-11-01), Yost
patent: 5037202 (1991-08-01), Batchelder et al.
patent: 5196997 (1993-03-01), Kutaberg et al.
patent: 5298967 (1994-03-01), Wells
patent: 5522933 (1996-06-01), Geller et al.
patent: 5553496 (1996-09-01), Nishiyama et al.
Patent Abstracts of Japan Abs Grp P1338, vol. 16, No. 155 Abs Pub Date Arp. 16, 1992 (4-6437) "Particulate Measuring System".
Patent Abstracts of Europe "Method and Apparatus for Tuning Fields for Plasma Processing Using Corrected Electrode" Abstract of EP 663682 dated Jul. 19, 1995.
Cantwell Nancy
Chandrachood Madhavi
Geller Anthony S.
Ghanayem Steve G.
Rader Daniel J.
Applied Materials Inc.
Noland Thomas P.
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