Particle detecting method and system for detecting minute partic

Details Particle detecting method and system for detecting minute partic Particle detecting method and system for detecting minute partic

1997-08-01

1999-05-25

Kim, Robert H.

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

3562374, G01N 2100

Patent

active

059073985

ABSTRACT:
In a particle detecting method, a light beam is projected on a surface of a workpiece. By a microscope focused on a spot of the light beam, formed is an image of irregularly reflected light irregularly reflected by a minute dust particle lying on the surface of the workpiece. The image of the irregularly reflected light is taken by an image pickup tube disposed at a position corresponding to the eyepiece unit of the microscope. The image of the irregularly reflected light is displayed on a screen of a display tube. The image is analyzed by a computer to determine the position of the minute dust particle on the workpiece in an X-Y plane. Further, the workpiece or the microscope is moved in an X-Y plane to inspect the entire surface of the workpiece.

REFERENCES:
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patent: 5023714 (1991-06-01), Lemelson
patent: 5157463 (1992-10-01), Brown et al.
patent: 5517027 (1996-05-01), Nakagawa et al.
patent: 5694214 (1997-12-01), Watanabe et al.
patent: 5715052 (1998-02-01), Fujino et al.
"Analysis and Evaluation Technology for High Performance Semiconductor Process" (Ultra Clean Technology Series No. 13) Published May 29, 1992--Partial English Translation pp. 111-120.
"Semiconductor Measurement and Evaluation Dictionary" Published Feb. 10, 1994--partial English Translation pp. 474-475.

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