Particle-beam imaging system

Details Particle-beam imaging system Particle-beam imaging system

1993-03-30

1995-01-03

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3730

Patent

active

053789172

ABSTRACT:
In an ion optical imaging system, especially for lithographic imaging on a wafer, two collecting lenses are provided between the mask and the wafer. At least one of the collecting lenses is a three-electrode grid lens, i.e. a lens in which a grid is disposed perpendicular to the optical axis between a pair of tubular electrodes.

REFERENCES:
patent: 4985634 (1991-01-01), Stengl et al.
Zworykin et al., Electron Optics and the Electron Microscope, 1945, pp. 449-452.

Affiliated with

Also associated with

Rating

Particle-beam imaging system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Particle-beam imaging system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Particle-beam imaging system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2212987