Particle beam apparatus having an immersion lens arranged in an

Details Particle beam apparatus having an immersion lens arranged in an Particle beam apparatus having an immersion lens arranged in an

1991-04-25

1992-09-08

Berman, Jack I.

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

250311, 250396ML, 250397, H01J 3704

Patent

active

051460904

ABSTRACT:
Particle beam apparatus for improving the spatial resolution of a conventional scanning electron microscope given low electron energies and adequately great working distances, an electrostatic immersion lens is arranged in the region of an intermediate image generated by a condenser unit. The immersion lens is composed of a beam-guiding tube that is at an anode potential and of a further tube electrode that is arranged and insulated in the column of the scanning electron microscope and is charged with a high positive potential. Since the tube electrode extends into the region of the pole piece gap of the objective lens, an electrical field that decelerates the electrons to the desired ultimate energy is built up at this location. Due to the retarding field overlaid on the focusing magnetic field of the objective lens, the lens has extremely low chromatic aberration and spherical aberration constants. Moreover, the influence of the Boersch effect is considerably diminished as a consequence of the high average kinetic energy of the primary electrons in the column.

REFERENCES:
patent: 4675524 (1987-06-01), Frosien et al.
patent: 4713543 (1987-12-01), Feuerbaum et al.
patent: 4728790 (1988-03-01), Plies
patent: 4766314 (1988-08-01), Jung
patent: 4785176 (1988-11-01), Frosien et al.
patent: 4831266 (1989-05-01), Frosien et al.
patent: 4896036 (1990-01-01), Rose et al.
"High Performance Electron Optical Column for Testing ICs with Submicrometer Design Rules" by Erich Plies, Microelectronic Eng. 7, 1987, pp. 163-172.

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