Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1973-11-26
1976-01-27
Gensler, Paul L.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
3132314, 313362, 3151117, 331 945C, 331 945G, 331DIG1, 328233, H05H 112
Patent
active
039355039
ABSTRACT:
Charged particles are entrained in a predetermined direction, independent of their polarity, in a circular orbit by a magnetic field rotating at high speed about an axis in a closed cylindrical or toroidal vessel. The field may be generated by a cylindrical laser structure, whose beam is polygonally reflected from the walls of an excited cavity centered on the axis, or by high-frequency energization of a set of electromagnets perpendicular to the axis. In the latter case, a separate magnetostatic axial field limits the orbital radius of the particles. These rotating and stationary magnetic fields may be generated centrally or by individual magnets peripherally spaced along its circular orbit. Chemical or nuclear reactions can be induced by collisions between the orbiting particles and an injected reactant, or by diverting high-speed particles from one doughnut into the path of counterrotating particles in an adjoining doughnut.
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patent: 3715581 (1973-02-01), Matsuda
patent: 3778612 (1973-12-01), Ashkin
patent: 3801438 (1974-04-01), Ohkawa
Gensler Paul L.
The Kreidl Chemico Physical K.G.
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