Pad cleaning method

Details Pad cleaning method Pad cleaning method

2006-06-27

2008-11-18

Rose, Robert (Department: 3723)

Abrading

Abrading process

With tool treating or forming

C451S443000, C451S072000

Reexamination Certificate

active

07452264

ABSTRACT:
A method for cleaning a polishing pad is disclosed. In CMP and ECMP, a polishing pad must be conditioned to obtain good and predictable polishing results. During conditioning, debris is generated that must be removed to prevent processing defects. An effective method to clean a polishing pad is disclosed herein. In one embodiment, a washing fluid is directed at the pad to clean debris from the while a second fluid is utilized to remove the washing fluid. In another embodiment, the washing fluid is provided by a high pressure water jet while the second fluid is provided by an air knife.

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