Oxygen scavenging in a plasma reactor

Details Oxygen scavenging in a plasma reactor Oxygen scavenging in a plasma reactor

1991-06-21

1993-10-19

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 427111, 427569, 423594, H01L 2100

Patent

active

052542165

ABSTRACT:
Trace amounts of oxygen are removed from a plasma reactor by heating a filament during the times the reactor is not processing to cause the filament to react with the oxygen in the reactor, and forms an oxide of the filament material and the oxygen.

REFERENCES:
patent: 4800070 (1989-01-01), Carlin et al.
patent: 4927398 (1990-05-01), Shaffer
patent: 5068007 (1991-11-01), Rogers et al.
Plasma Etching in Semiconductor Fabrication; ed. Russ A. Morgan; .COPYRGT.1985; N.Y., N.Y.; pp. 96-97.

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