Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-06-14
1991-06-25
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430271, 430272, 430275, 430281, 430918, 522106, 522110, G03C 1725
Patent
active
050266268
ABSTRACT:
A photopolymeriziable composition which comprises poly butane diol diacrylate, a photoinitiator and a binding resin. Upon coating the composition onto a substrate a photographic element is formed which does not require the presence of an oxygen barrier layer.
REFERENCES:
patent: 4259432 (1981-03-01), Kondoh et al.
patent: 4264705 (1981-04-01), Allen
patent: 4288527 (1981-09-01), Morgan
patent: 4298679 (1981-11-01), Shinozaki et al.
patent: 4361640 (1982-11-01), Pine
patent: 4522913 (1985-06-01), Kanno et al.
patent: 4536468 (1985-08-01), Yasui et al.
patent: 4572888 (1986-02-01), Maeda et al.
patent: 4587201 (1986-05-01), Morikawa et al.
patent: 4705740 (1987-11-01), Geissler et al.
English Language Abstract of Japanese Kokai JP 758158 7/22/76.
English Language Abstract of German Offen. 2422378 11/6/76.
English Language Abstract of German Offen. 2307923 10/11/73.
Chemical Abstracts Registry No. 25067-24-7.
Barton Oliver A.
Wright James D.
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