Oximesulfonic acid esters and the use thereof as latent sulfonic

Details Oximesulfonic acid esters and the use thereof as latent sulfonic Oximesulfonic acid esters and the use thereof as latent sulfonic

1996-10-28

2000-01-25

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430919, 430921, 522 59, G03C 1492

Patent

active

06017675&

ABSTRACT:
The invention relates to the use of oximesulfonic acid esters of formula I ##STR1## m is 0 or 1 and x is 1 or 2; R.sub.1 is, for example, substituted phenyl, R.sub.2 has, for example, one of the meanings of R.sub.1 or is unsubstituted phenyl, C.sub.1 -C.sub.6 alkanoyl, unsubstituted or substituted benzoyl, C.sub.2 -C.sub.6 alkoxycarbonyl or phenoxycarbonyl; or R.sub.1 and R.sub.2, if necessary together with the CO group, form a ring, R.sub.3, when x is 1, is, for example, C.sub.1 -C.sub.18 alkyl, phenyl or phenanthryl, the radicals phenyl and phenanthryl being unsubstituted or substituted, or R.sub.3, when x is 2, is, for example, C.sub.2 -C.sub.12 alkylene, phenylene or oxydiphenylene, the radicals phenylene and oxydiphenylene being unsubstituted or substituted, as latent acid donors, especially at wavelengths over 390 nm, and to the use of the compounds in the production of photoresists.

REFERENCES:
patent: 4347372 (1982-08-01), Fory et al.
patent: 4451286 (1984-05-01), Martin
patent: 4540598 (1985-09-01), Berner et al.
patent: 4715883 (1987-12-01), Lukaszczyk et al.
patent: 4736055 (1988-04-01), Dietliker et al.
patent: 5714625 (1998-02-01), Hada et al.
Abstract Derwent No. B7-286243/41 of EP-241423.
Derwent Abstract 93-370703/47 of EP 571,330.

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