Oxime derivatives and the use thereof as latent acids

Details Oxime derivatives and the use thereof as latent acids Oxime derivatives and the use thereof as latent acids

2007-07-17

2007-07-17

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C564S253000

Reexamination Certificate

active

11262104

ABSTRACT:
New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VIIR1is for example C1–C18alkylsulfonyl, R2is halogen or C1–C10haloalkyl; R3is for example unsubstitude or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1is for example a direct bond, C1–C12alkylene; —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11and A12are for example a direct bond, —O—, or —S—, or are C1–C12alkylene or phenylene unsubstituted or substituted; Y1is C1–C12alkylene which is for example substituted by OR4, or SR7; Y2is e.g. a trivalent radical of C1–C12alkylene; Y3is e.g. a tetravalent radical of C1–C12alkylene; X is halogen; Ar′1is for example C1–C12alkyl which is unsubstituted or substituted; Ar″1is for example phenylene; provided that at least one of the radicals Ar′1, Ar″1, is substituted by 1 to 3 groups ofexample halogen; R15, R16, R17and R18e.g. hydrogen or phenyl; R19, R20, R21, R22R23are e.g. phenyl; are especially suitable for the preparation of photoresists.

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