Oxide strip that improves planarity

Details Oxide strip that improves planarity Oxide strip that improves planarity

1996-12-13

1998-06-16

Dang, Trung

Fishing, trapping, and vermin destroying

437228IS, 437228H, 216 39, 216 58, 148DIG50, H01L 2176

Patent

active

057669716

ABSTRACT:
A process for stripping thin layers of oxide such as sacrificial pad oxide employs etching chemistry that widens cracks to remove shallow cracks and limit the widening of deep cracks, thereby producing a final oxide surface on thick layers of oxide that is less rough than prior art methods and enabling the fabrication of oxide-filled trenches that have geometries and/or surface smoothness that were previously impossible.

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Burggraaf, Pieter, "CMP: Suppliers Integrating, Applications Spreading", Semiconductor International, Nov. 1995, pp. 74-82.
Singer, Peter, "New Frontiers in Plasma Etching", Semiconductor International, Jul. 1996, pp. 152-164.

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