Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-04-20
1995-06-06
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 20419226, C23C 1434
Patent
active
054219760
ABSTRACT:
The improved diamond composite (10) exhibits increased oxidation resistance at elevated temperatures, as well as anti-reflective properties. The composite (10) includes a diamond (12), the surfaces (14) of which are protected by an adherent coating (16) consisting essentially of a layer (18) of hafnium carbide adhering and chemically bonded to the diamond (12), a layer (20) of hafnium oxy-carbide adhering and chemically bonded to the hafnium carbide layer (18) and an oxidation-resistant layer (22) of hafnium oxide adhering and chemically bonded to the hafnium oxy-carbide layer (20). Preferably, the coating (16) is sufficiently thin so that it or at least the hafnium oxide layer (22) thereof has about one-quarterwavelength thickness. The method of forming the composite (10) employs sputtering hafnium metal in an argon atmosphere, preferably at about 100-150 degrees Celsius, to form the hafnium carbide layer (18), then continuing the sputtering in an oxygen and argon mixture to first form the hafnium oxy-carbide layer (20) and then the hafnium oxide layer (22). The sputtering is followed by heat treating the composite (10) in an oxygen atmosphere at preferably about 350-450 degrees Celsius for about 4-24 hours to assure full utilization of the hafnium metal. This method is simple, inexpensive and effective.
REFERENCES:
patent: 4341843 (1982-07-01), Brainard et al.
patent: 4871434 (1989-10-01), Munz et al.
patent: 4973388 (1990-11-01), Francois et al.
patent: 5192410 (1993-03-01), Ito et al.
Brown Charles D.
Denson-Low Wanda K.
Heald Randall M.
Hughes Missile Systems Company
Nguyen Nam
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