Oxidation of material in high pressure oxygen plasma

Details Oxidation of material in high pressure oxygen plasma Oxidation of material in high pressure oxygen plasma

1984-10-02

1985-11-26

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 2, 156646, 156655, 427 39, 427 86, B44C 122, C03C 1500, C03C 2506

Patent

active

045553033

ABSTRACT:
A process is disclosed for removing carbonaceous material from a surface in a high pressure oxygen plasma. A surface, such as a surface of a silicon ribbon, having a layer of carbonaceous material thereon is positioned in a high pressure plasma reaction volume. A high pressure rf plasma is generated in which the plasma includes reactive and ionic oxygen species. The reactive oxygen species are directed to and react with the layer of carbonaceous material to oxidize that material. The reaction products of the oxidation step include carbon dioxide and, possibly a non-oxidizing ash material which can easily be removed from the silicon surface.

REFERENCES:
patent: 3425878 (1969-02-01), Dersin et al.
patent: 4370288 (1983-01-01), Rice et al.

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