Oxabicyclo compound, a polymer-containing said compound, and a p

Details Oxabicyclo compound, a polymer-containing said compound, and a p Oxabicyclo compound, a polymer-containing said compound, and a p

1999-05-13

2000-11-21

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 430326, 526268, 526271, 526281, G03F 7004

Patent

active

061500690

ABSTRACT:
The present invention relates to oxabicyclo compounds and a method of preparing the same. The compounds of the present invention can be used as monomers for preparing a photoresist resin which is useful in photolithography processes using ultra-violet light sources, and are represented by the following Formula 1: ##STR1## wherein, R.sub.1 and R.sub.2 are the same or different, and represent a hydrogen or a C.sub.1 -C.sub.4 straight or branched chain substituted alkyl group; and m is a number from 1 to 4.
In other embodiments, the present invention relates to an ArF or a KrF photoresist resin containing an oxabicyclo monomer, and compositions and photoresist micro pattern forming methods using the same.

REFERENCES:
patent: 4440850 (1984-04-01), Paul et al.

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