Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-02-13
2007-02-13
Bali, Vikkram (Department: 2623)
Image analysis
Applications
Manufacturing or product inspection
C382S145000
Reexamination Certificate
active
10184026
ABSTRACT:
An overlay mark for determining the relative shift between two or more successive layers of a substrate via scanning is disclosed. The overlay mark includes at least one test pattern for determining the relative shift between a first and a second layer of the substrate in a first direction. The test pattern includes a first set of working zones and a second set of working zones. The first set of working zones are disposed on a first layer of the substrate and have at least two working zones diagonally opposed and spatially offset relative to one another. The second set of working zones are disposed on a second layer of the substrate and have at least two working zones diagonally opposed and spatially offset relative to one another. The first set of working zones are generally angled relative to the second set of working zones thus forming an “X” shaped test pattern.
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Adel Michael
Ghinovker Mark
Mieher Walter Dean
Bali Vikkram
Beyer Weaver & Thomas LLP
KLA-Tencor Corporation
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