Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-01-10
2006-01-10
Bali, Vikkram (Department: 2623)
Image analysis
Applications
Manufacturing or product inspection
C382S147000, C382S149000
Reexamination Certificate
active
06985618
ABSTRACT:
A method of designing an overlay mark, which is used to determine the relative position between two or more successive layers of a substrate or between two or more separately generated patterns on a single layer of a substrate, is disclosed. The method includes optimizing the geometry of a first element of the mark according to a first scale. The method further includes optimizing the geometry of a second element of the mark according to a second scale. The method additionally includes optimizing the geometry of a third element of the mark according to a third scale.
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Adel Michael
Ghinovker Mark
Mieher Walter Dean
Bali Vikkram
Beyer Weaver & Thomas LLP
KLA-Tencor Technologies Corporation
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