Overcoating composition for photoresist and method for...

Details Overcoating composition for photoresist and method for... Overcoating composition for photoresist and method for...

2005-07-12

2005-07-12

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S271100, C430S273100, C430S311000, C430S330000

Reexamination Certificate

active

06916594

ABSTRACT:
Overcoating compositions for photoresist and methods for reducing linewidth of the photoresist patterns are disclosed. More specifically, an overcoating composition containing acids is coated on a whole surface of a photoresist pattern formed by a common lithography process to diffuse the acids into the photoresist pattern. The photoresist in the portion where the acids are diffused is developed with an alkali solution to be removed. As a result, the linewidth of positive photoresist patterns can be reduced, and the linewidth of negative photoresist patterns can be prevented from slimming in a subsequent linewidth measurement process using SEM.

REFERENCES:
patent: 6416930 (2002-07-01), Wakiya et al.
patent: 6673517 (2004-01-01), Nishi et al.

Affiliated with

Also associated with

Rating

Overcoating composition for photoresist and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Overcoating composition for photoresist and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Overcoating composition for photoresist and method for... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3430957