Oven for the heat treatment of semiconductor substrates

Details Oven for the heat treatment of semiconductor substrates Oven for the heat treatment of semiconductor substrates

1987-06-09

1988-10-04

Yuen, Henry C.

Heating

Work feeding, agitating, discharging or conveying...

Removable furnace bottom section or kiln cart

4322542, 432258, F27B 926

Patent

active

047753170

ABSTRACT:
An oven for the heat treatment of semiconductor substrates, especially a diffusion oven, having an upright, heatable quartz tube and a support system made of up rods or tubes into which one or more diffusion racks can be inserted which accommodate the wafer-like substrates separated from one another and substantially parallel to one another. To create a vertically operated oven having a rheologically efficient construction in which the support system for holding the diffusion racks will be highly variable, the support system has at least two vertical supports arranged parallel to one another, on which at least one rack rest 9 is disposed, on which rack rest the diffusion rack is placed such that the substrate wafers 8 stand substantially on edge during the treatment.

REFERENCES:
patent: 614768 (1898-11-01), Schwedtmann
patent: 1895408 (1933-01-01), Davis
patent: 2558088 (1951-06-01), Hoop
patent: 2629917 (1953-03-01), Lovatt
patent: 2879577 (1959-03-01), Milburn
patent: 3997289 (1976-12-01), Bowers
patent: 4102637 (1978-07-01), Kreider et al.
patent: 4412812 (1983-11-01), Sadowski et al.
patent: 4487579 (1984-12-01), Irwin

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