Original pattern plate obtained by use of photo-sensitive resin

Details Original pattern plate obtained by use of photo-sensitive resin Original pattern plate obtained by use of photo-sensitive resin

1976-03-26

1981-01-27

Welsh, John D.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

430306, 430307, 430330, 430322, 430281, 430285, 430917, 430920, G03C 170

Patent

active

042476216

ABSTRACT:
An original pattern plate obtained by the use of a photo-sensitive resin composition comprising:

REFERENCES:
patent: 2760863 (1956-08-01), Plambeck, Jr.
patent: 3595664 (1971-07-01), Rust

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