Oriented polystyrene support for photopolymerizable element

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430166, 430271, 430319, 430496, 430501, 430509, 430531, 430534, 430536, 430537, 430935, 430939, 430961, G03C 176, G03C 300, G03C 178

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active

043012302

ABSTRACT:
A process for producing an image which comprises the steps of:
(1) applying to the surface of a substrate the surface of a photosensitive layer, the other surface of the photosensitive layer being adhered to a substantially transparent film support which is soluble or dispersible in a developer consisting essentially of a liquid capable of substantially dissolving or dispersing therein the areas of the layer other than those having a polymeric image produced by imagewise exposure in the step (2) below;
(2) exposing the photosensitive layer, imagewise, to actinic radiation to form a polymeric image in the layer; and
(3) washing away with the developer the film support and the areas of the layer other than those having the polymeric image to form an image of a polymeric material on the substrate. The photosensitive element having on its one side the above-mentioned specific film support and the process have a variety of applications and are useful for producing photoresists which are advantageously used for making printed circuit boards.

REFERENCES:
patent: 3186844 (1965-06-01), Alles et al.
patent: 3458311 (1969-07-01), Alles
patent: 3469982 (1969-09-01), Celeste
patent: 3895949 (1975-07-01), Akamatsu et al.
patent: 4072527 (1978-02-01), Fan
patent: 4126466 (1978-11-01), Roos
patent: 4217407 (1980-08-01), Watanabe et al.

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