Organosilicate polymer and insulating film therefrom

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S780000, C257SE21260

Reexamination Certificate

active

11172961

ABSTRACT:
Provided is a process for manufacturing an insulating film for a semiconductor device. The process includes preparing a composition for forming an insulating film, wherein the composition comprises a) an organosilicate polymer and b) an organic solvent. The composition is coated on a substrate of a semiconductor device to prepare a coated insulating film, and the coated insulated film is dried and cured. Also provided are an insulating film prepared as described as well as a semiconductor device comprising the insulating film.

REFERENCES:
patent: 5302734 (1994-04-01), Jung et al.
patent: 5912313 (1999-06-01), McIntosh et al.
patent: 6933360 (2005-08-01), Ko et al.
patent: 591149 (1947-08-01), None
patent: 2000-309752 (2000-11-01), None
Brodani et al., In: tetrahedron Letters, vol. 34, No. 13, (Mar. 26, 1993, pp. 2111-2114.
Brondani et al., Journal of Organometallic Chemistry, vol. 451, (1993), C1-C3.
Corriu et al., Mater. Chem. vol. 4, (1992), pp. 1217-1224.
Corriu et al., J. Mater Chem., vol. 4, (2000), pp. 1113-1120.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Organosilicate polymer and insulating film therefrom does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Organosilicate polymer and insulating film therefrom, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Organosilicate polymer and insulating film therefrom will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3766963

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.