Organometal-containing polymers and use thereof in a photosensit

Details Organometal-containing polymers and use thereof in a photosensit Organometal-containing polymers and use thereof in a photosensit

1990-09-24

1991-06-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430914, G03C 176

Patent

active

050249169

ABSTRACT:
Organometal-containing polymers having side chains of the formula I ##STR1## in which, for example, M is Si, X is O, R.sup.1 and R.sup.2 are hydrogen and R.sup.4 to R.sup.6 are each methyl and which have an average molecular weight between 1,000 and 1,000,000, are suitable for the preparation of dry-developable photoresists, such as are required for the generation of structured images, in particular in microelectronics.

REFERENCES:
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patent: 4689289 (1987-08-01), Crivello
patent: 4752552 (1988-06-01), Aoai
patent: 4788127 (1988-11-01), Bailey et al.
patent: 4842986 (1989-06-01), Matsuda et al.
patent: 4853453 (1989-08-01), Schafer et al.

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