Organic solvent free developer compositions for lithographic pla

Details Organic solvent free developer compositions for lithographic pla Organic solvent free developer compositions for lithographic pla

1987-02-17

1988-10-25

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430309, G03C 518

Patent

active

047803967

ABSTRACT:
An organic solvent free developer composition having a pH in the range of from about 6.5 to about 7.5 comprising in admixture:

REFERENCES:
patent: 3891439 (1975-06-01), Katz et al.
patent: 4147545 (1979-04-01), Rowe et al.
patent: 4350756 (1982-09-01), Burch et al.
patent: 4436807 (1984-03-01), Walls
patent: 4692397 (1987-09-01), Liu

Affiliated with

Also associated with

Rating

Organic solvent free developer compositions for lithographic pla does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Organic solvent free developer compositions for lithographic pla, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Organic solvent free developer compositions for lithographic pla will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2269169