Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2005-08-30
2005-08-30
Barreca, Nicole (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S313000, C430S322000, C430S323000, C430S330000, C430S950000, C427S255140, C427S255280, C427S255600, C427S487000, C427S585000
Reexamination Certificate
active
06936405
ABSTRACT:
An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 μm or smaller) features.
REFERENCES:
patent: 4747674 (1988-05-01), Butterfield et al.
patent: 5137780 (1992-08-01), Nichols et al.
patent: 5153986 (1992-10-01), Brauer et al.
patent: 5169494 (1992-12-01), Hashimoto et al.
patent: 5198153 (1993-03-01), Angelopoulos et al.
patent: 5302548 (1994-04-01), Watanabe et al.
patent: 5443941 (1995-08-01), Bariya et al.
patent: 5545588 (1996-08-01), Yoo
patent: 5607824 (1997-03-01), Fahey et al.
patent: 5654376 (1997-08-01), Knors et al.
patent: 5733712 (1998-03-01), Tanaka et al.
patent: 5968324 (1999-10-01), Cheung et al.
patent: 5991081 (1999-11-01), Haaland et al.
patent: 6063547 (2000-05-01), Ye et al.
patent: 6150010 (2000-11-01), Eissa
patent: 6277750 (2001-08-01), Pawlowski et al.
patent: 6300240 (2001-10-01), Linlui et al.
patent: 6300672 (2001-10-01), Lee
patent: 6309955 (2001-10-01), Subramanian et al.
patent: 2001/0021481 (2001-09-01), Sabnis et al.
patent: 07-198908 (1995-08-01), None
patent: 07-211616 (1995-08-01), None
patent: 8-064492 (1996-03-01), None
JP 08-064492, English translation from USPTO, “Anti-Reflective Film and Pattern Formation Method which uses the same”, Aug. 1996.
Linliu et al., “A Novel Polymeric Anti-Reflective Coating (PARC) for DRAM, Flash and Logic Device with 0.1 micron COSi2 Gate”, Worldwide Semiconductor Manufacturing Corp., 2000.
NN73101442, IBM Technical Disclosure Bulletin, “Antireflection Coatings for the Enhancement of Magneto Optic Effects in Amorphous Rare Earth Transition Metal Alloys”, Oct. 1973.
Brewer Terry
Guerrero Douglas J.
Sabnis Ram W.
Spencer Mary J.
Barreca Nicole
Brewer Science Inc.
Hovey & Williams, LLP
LandOfFree
Organic polymeric antireflective coatings deposited by... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Organic polymeric antireflective coatings deposited by..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Organic polymeric antireflective coatings deposited by... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3522754