Organic coating film and radiation-sensitive member having the f

Details Organic coating film and radiation-sensitive member having the f Organic coating film and radiation-sensitive member having the f

1984-02-06

1985-11-26

Martin, Roland E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430275, 430495, 430592, 430594, 430595, 546152, 548159, 548179, 548467, G03C 172, G03C 194

Patent

active

045554722

ABSTRACT:
An optical recording member having an organic coating film comprising a compound of the general formula: ##STR1## wherein; Z.sub.1 is an atomic group necessary to form a substituted or unsubstituted nitrogen-containing heterocyclic compound ring; Z.sub.2 is an atomic group necessary to form a substituted or unsubstituted pyrane, thiapyrane, selenapyrane, benzopyrane, benzothiapyrane, benzoselenapyrane, naphthopyrane, naphathiopyrane, or naphthoselenapyrane ring; X is a sulfur, oxygen, or selenium; Z.sub.3 is a divalent hydrocarbon residue necessary to form a 5- or 6-membered ring substituted or unsubstituted; R.sub.11 is a hydrogen atom or substituted or unsubstituted alkyl; R.sub.12 and R.sub.13 each are a hydrogen atom, halogen atom, alkyl, alkoxy, aryl, substituted aryl, styryl, substituted styryl, or substituted or unsubstituted heterocyclic residue; R.sub.14 is a hydrogen or halogen atom; A.sup..crclbar. is an anion; m and n each are 0 or 1; and l is 0, 1, or 2.

REFERENCES:
patent: 2474426 (1949-06-01), Kendall et al.
patent: 2972539 (1961-02-01), Jones
patent: 3579346 (1971-05-01), Brooker et al.
patent: 4492750 (1985-01-01), Law et al.

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