Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reissue Patent
2007-01-25
2010-02-16
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S271100, C430S272100, C430S275100, C430S278100, C430S280100, C430S286100, C430S287100, C430S313000, C430S325000, C430S326000, C430S905000, C430S908000, C430S910000, C522S088000, C522S107000, C522S120000, C522S141000
Reissue Patent
active
RE041128
ABSTRACT:
New polymers and new anti-reflective compositions containing such polymers are provided. The compositions comprise a polymer (e.g., epoxy cresol novolac resins) bonded with a chromophore (4-hydroxybenzoic acid, trimellitic anhydride). The inventive compositions can be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
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Nakano et al., “Positive-Type Photopolyimide Based on Vinyl Ether Crosslinking and De-Crosslinking,”J. Photopolym. Sci. Technol.,vol. 13, No. 5, 2000, pp. 715-718.
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Brewer Science Inc.
Hovey & Williams, LLP
Lee Sin J.
LandOfFree
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