Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-02-27
1997-02-18
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302701, 522170, G03C 1725, C08F 246
Patent
active
056040806
ABSTRACT:
Disclosed are an organic acid salt of melamine represented by the following general formula (1) and a thermosetting and a photocurable and thermosetting coating compositions containing the salt mentioned above. ##STR1## wherein Z represents ##STR2## wherein R.sup.1 represents a hydrogen atom or an alkyl group, alkylene group, alicyclic hydrocarbon, or aromatic hydrocarbon severally having from 1 to 18 carbon atoms, or any of said groups or hydrocarbons whose hydrogen atom is substituted by carboxyl group, hydroxyl group, or a halogen atom, R.sup.2 represents a hydrogen atom or an alkyl group or alkylene group severally having from 1 to 9 carbon atoms, or any of said groups whose hydrogen atom is substituted by acryloyl group or methacryloyl group, R.sup.3 represents an alkyl group or alkylene group severally having from 1 to 9 carbon atoms, or any of said groups whose hydrogen atom is substituted by acryloyl group or methacryloyl group, and R.sup.4 represents an alkyl group or aromatic hydrocarbon severally having from 1 to 18 carbon atoms, or any of said group or hydrocarbon whose hydrogen atom is substituted by acryloyl group or methacryloyl group.
REFERENCES:
patent: 4943516 (1990-07-01), Kamayachi et al.
patent: 5093223 (1992-03-01), Iwasawa et al.
patent: 5100767 (1992-03-01), Yanagawa et al.
Fukushima Kazunobu
Ichikawa Kyo
Inagaki Hitoshi
Saito Teruo
Suzuki Nobuyuki
Chapman Mark
Taiyo Ink Manufacturing Co., Ltd.
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