Orbital chemical mechanical polishing apparatus and method

Details Orbital chemical mechanical polishing apparatus and method Orbital chemical mechanical polishing apparatus and method

1993-12-27

1996-12-10

Eley, Timothy V.

Abrading

Abrading process

Glass or stone abrading

451270, 451288, 451291, B24B 100, B24B 700

Patent

active

055825346

ABSTRACT:
A process for polishing substrates includes a carrier which receives a substrate and positions it against a slowly rotating polishing pad. The carrier orbits the pad on the rotating pad, at a speed significantly greater than the rotational speed of the polishing pad, to ensure that the movement of the polishing pad is a very small increment of the cumulative motion between the pad and substrate.

REFERENCES:
patent: Re34425 (1993-11-01), Schultz
patent: 3137977 (1964-06-01), Graves
patent: 3156073 (1964-11-01), Strasbaugh
patent: 3170273 (1965-02-01), Walsh
patent: 3342652 (1967-09-01), Reisman et al.
patent: 3559346 (1971-02-01), Paola
patent: 3708921 (1973-01-01), Cronkhite et al.
patent: 3748790 (1973-07-01), Pizzarello et al.
patent: 3841031 (1974-10-01), Walsh
patent: 3906678 (1975-12-01), Roth
patent: 3962832 (1976-06-01), Strasbaugh
patent: 3978622 (1976-12-01), Mazur et al.
patent: 3986433 (1976-10-01), Walsh et al.
patent: 4143490 (1979-03-01), Wood
patent: 4239567 (1980-12-01), Winings
patent: 4256535 (1981-03-01), Banks
patent: 4257194 (1981-03-01), Cailloux
patent: 4373991 (1983-02-01), Banks
patent: 4380412 (1983-04-01), Walsh
patent: 4525954 (1985-07-01), Larsen
patent: 4653231 (1987-03-01), Cronkhite et al.
patent: 4680893 (1987-07-01), Cronkhite et al.
patent: 4831784 (1989-05-01), Takahashi
patent: 4839993 (1989-06-01), Masuko et al.
patent: 4873792 (1989-10-01), Linke et al.
patent: 4918870 (1990-04-01), Torbert et al.
patent: 4940507 (1990-07-01), Harbarger
patent: 4944836 (1990-07-01), Beyer et al.
patent: 4956313 (1990-09-01), Cote et al.
patent: 4992135 (1991-02-01), Doan
patent: 4996798 (1991-03-01), Moore
patent: 5020283 (1991-06-01), Tuttle
patent: 5036015 (1991-07-01), Sandhu et al.
patent: 5064683 (1991-11-01), Poon et al.
patent: 5069002 (1991-12-01), Sandhu et al.
patent: 5081796 (1992-01-01), Schultz
patent: 5114875 (1992-05-01), Baker et al.
patent: 5169491 (1992-12-01), Doan
patent: 5205077 (1993-04-01), Wittstock
patent: 5205082 (1993-04-01), Shendon et al.
patent: 5209816 (1993-05-01), Yu et al.
patent: 5216843 (1993-05-01), Breivogel et al.
patent: 5222329 (1993-06-01), Yu
patent: 5225034 (1993-07-01), Yu et al.
patent: 5232875 (1993-08-01), Tuttle et al.
patent: 5234867 (1993-08-01), Schultz et al.
patent: 5244534 (1993-09-01), Yu et al.
patent: 5297364 (1994-03-01), Tuttle
patent: 5302233 (1994-04-01), Kim et al.
patent: 5333413 (1994-08-01), Hashimoto
Pp. 20 to 24 of EBARA CMP System Brochure.

Affiliated with

Also associated with

Rating

Orbital chemical mechanical polishing apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Orbital chemical mechanical polishing apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Orbital chemical mechanical polishing apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-420628