Optoelectronic devices utilizing multiple quantum well pin struc

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

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257 21, 257 85, 257185, 257191, 257458, 359248, H01L 2906, H01L 310328, H01L 310336

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active

056273835

ABSTRACT:
Optoelectronic devices such as photodetectors, modulators and lasers with improved optical properties are provided with an atomically smooth transition between the buried conductive layer and quantum-well-diode-containing intrinsic region of a p-i-n structure. The buried conductive layer is grown on an underlying substrate utilizing a surfactant-assisted growth technique. The dopant and dopant concentration are selected, as a function of the thickness of the conductive layer to be formed, so that a surface impurity concentration of from 0.1 to 1 monolayer of dopant atoms is provided. The presence of the impurities promotes atomic ordering at the interface between the conductive layer and the intrinsic region, and subsequently results in sharp barriers between the alternating layers comprising the quantum-well-diodes of the intrinsic layer.

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patent: 5210428 (1993-05-01), Goosen
patent: 5329136 (1994-07-01), Goosen
"Stacking Fault Free Epitaxial Layers", IBM Technical Disclosure Bulletin, vol. 14, No. 5, Oct. 1971, p. 1654.

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