Optics: measuring and testing – Angle measuring or angular axial alignment – With photodetection remote from measured angle
Reexamination Certificate
2011-06-14
2011-06-14
Tarcza, Thomas H (Department: 3662)
Optics: measuring and testing
Angle measuring or angular axial alignment
With photodetection remote from measured angle
C250S231130, C396S089000
Reexamination Certificate
active
07961306
ABSTRACT:
Provided is a method of optimizing sensitivity of measurements of an optical metrology tool using two or more illumination beams directed to a structure on a workpiece comprising selecting target structures for measurement, obtaining diffraction signals off the selected structures as a function of angle of incidence for each illumination beam, determining a selected angle of incidence for each of the two or more illumination beams, setting sensitivity objectives for optical metrology measurements, developing a design for the optical metrology tool to achieve the corresponding selected angle of incidence of the two or more illumination beams, obtaining sensitivity data using the optical metrology tool, and if the sensitivity objectives are not met, adjusting the selection of target structures, the selected angle of incidence of the two or more illumination beams, the sensitivity objectives, and/or the design of the optical metrology tool, and iterating the developing of the design, obtaining sensitivity data, and comparing sensitivity data to sensitivity objectives until the sensitivity objectives are met.
REFERENCES:
patent: 5166752 (1992-11-01), Spanier et al.
patent: 5412473 (1995-05-01), Rosencwaig et al.
patent: 5486701 (1996-01-01), Norton et al.
patent: 5596406 (1997-01-01), Rosencwaig et al.
patent: 5747813 (1998-05-01), Norton et al.
patent: 5798837 (1998-08-01), Aspnes et al.
patent: 6184984 (2001-02-01), Lee et al.
patent: 6256097 (2001-07-01), Wagner
patent: 6429943 (2002-08-01), Opsal et al.
patent: 6778273 (2004-08-01), Norton et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6798512 (2004-09-01), Ebert et al.
patent: 6891626 (2005-05-01), Niu et al.
patent: 6943900 (2005-09-01), Jakatdar et al.
patent: 7006221 (2006-02-01), Wolf et al.
patent: 7081957 (2006-07-01), Norton et al.
patent: 7280229 (2007-10-01), Li et al.
patent: 7331676 (2008-02-01), Ferber et al.
patent: 7502101 (2009-03-01), Raymond et al.
patent: 2006/0289789 (2006-12-01), Raymond et al.
U.S. Appl. No. 12/050,053, filed Mar. 17, 2008 for Tian et al.
U.S. Appl. No. 12/050,919, filed Mar. 18, 2008 for Tian et al.
U.S. Appl. No. 12/057,316, filed Mar. 27, 2008 for Tian et al.
U.S. Appl. No. 12/057,332, filed Mar. 27, 2008 for Tian et al.
U.S. Appl. No. 12/057,346, filed Mar. 27, 2008 for Tian et al.
U.S. Appl. No. 12/059,610, filed Mar. 31, 2008 for Meng et al.
U.S. Appl. No. 12/141,754, filed Jun. 18, 2008 for Tian et al.
U.S. Appl. No. 12/141,867, filed Jun. 18, 2008 for Tian et al.
U.S. Appl. No. 12/141,892, filed Jun. 18, 2008 for Tian et al.
U.S. Appl. No. 12/413,945, filed Mar. 30, 2009 for Norton et al.
Li Shifang
Madriaga Manuel
Norton Adam
Madriaga Manuel B.
Ratcliffe Luke D
Tarcza Thomas H
Tokyo Electron Limited
LandOfFree
Optimizing sensitivity of optical metrology measurements does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Optimizing sensitivity of optical metrology measurements, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optimizing sensitivity of optical metrology measurements will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2744898