Optimized in-line mask cleaning system

Cleaning and liquid contact with solids – Processes – With treating fluid motion

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Details

134 11, B08B 304

Patent

active

059163747

ABSTRACT:
A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.

REFERENCES:
patent: 20359 (1858-05-01), Robertson
patent: 875614 (1907-08-01), Fihol
patent: 1987586 (1935-01-01), Dinley
patent: 4483040 (1984-11-01), Magee et al.
patent: 4753735 (1988-06-01), Figiel
patent: 4847004 (1989-07-01), McLeod
patent: 5747439 (1998-05-01), Dunn et al.

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