Optimized helical resonator for plasma processing

Details Optimized helical resonator for plasma processing Optimized helical resonator for plasma processing

1992-05-06

1993-08-31

Mis, David

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511151, 31511161, 31511171, 156643, 118623, H01J 724

Patent

active

052412458

ABSTRACT:
An optimized helical resonator which increases the plasma density for efficient processing of semiconductor wafers is characterized by a low inductance and, hence, a low Q. A first embodiment uses either a distributed or lumped capacitance to reduce the value of .omega.L to less than about 200 Ohms. A second embodiment uses a flat spiral coil having a low value of .omega.L and resonant as a 1/4 or 1/2 wave resonator. A third embodiment combines features of the first two embodiments using both spiral and solenoid coils as the helical resonator.

REFERENCES:
patent: 3873884 (1975-03-01), Gabriel
patent: 4368092 (1983-01-01), Steinberg et al.
patent: 4918031 (1990-04-01), Flamm et al.
patent: 4948458 (1990-08-01), Ogle
The Radio Amateur's Handbook, American Radio Relay League, 54th Edition, 1977; pp. 293-294.
William Sinnema, Electronic Transmission Technology, Prentice-Hall, Inc., 1979 pp. 54-62.

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