Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2006-04-21
2008-10-28
Masinick, Michael D (Department: 2128)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S108000, C700S121000, C430S311000, C430S312000, C430S313000, C430S315000, C430S321000, C356S305000, C356S326000, C356S328000
Reexamination Certificate
active
07444196
ABSTRACT:
A patterned structure in a wafer is created using one or more fabrication treatment processes. The patterned structure has a treated and an untreated portion. One or more diffraction sensitivity enhancement techniques are applied to the structure, the one or more diffraction sensitivity enhancement techniques adjusting one or more properties of the patterned structure to enhance diffraction contrast between the treated portion and untreated portions. A first diffraction signal is measured off an unpatterned structure on the wafer using an optical metrology device. A second diffraction signal is measured off the patterned structure on the wafer using the optical metrology device. One or more diffraction sensitivity enhancement techniques are selected based on comparisons of the first and second diffraction signals.
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Madriaga Manuel
Nolet Alan
Scheer Steven
Masinick Michael D
Morrison & Foerster / LLP
Timbre Technologies, Inc.
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