Optimization to avoid sidelobe printing

Details Optimization to avoid sidelobe printing Optimization to avoid sidelobe printing

2004-12-22

2009-02-24

Whitmore, Stacy A (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C430S005000, C700S121000, C382S144000

Reexamination Certificate

active

07496882

ABSTRACT:
A method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus is presented. In an embodiment of the invention, the method includes calculating a size of a printed sidelobe to be generated as a result of optical transfer of the mask pattern onto the substrate; and determining a plurality of lithographic parameters for optical transfer of the mask pattern onto the substrate that yields an optimization of a high latitude for the mask pattern and a small printed sidelobe size.

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