Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2011-06-07
2011-06-07
Vu, David Hung (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111510
Reexamination Certificate
active
07956543
ABSTRACT:
A radio frequency plasma generator power supply, including: an interface that receives a request to determine an optimal control frequency; an output interface configured to be connected to a plasma generation resonator; a power supply module configured to apply a voltage at a set point frequency to the output interface, the voltage, depending on its frequency, selectively unable to allow generation of plasma of the resonator on receipt of a request during a phase optimizing power supply frequency of the generator and able to allow generation of plasma of the resonator during an operating phase; an interface that receives an electrical measurement of power supply of the resonator; a module that determines optimal control frequency, successively provides various set point frequencies to the power supply module on receipt of a request, and determines an optimal control frequency depending on electrical measurements received by the reception interface.
REFERENCES:
patent: 4859909 (1989-08-01), Gualandris et al.
patent: 5513618 (1996-05-01), Rich et al.
patent: 5568801 (1996-10-01), Patterson et al.
patent: 5949193 (1999-09-01), Roine et al.
patent: 6740842 (2004-05-01), Johnson et al.
patent: 7793632 (2010-09-01), Idogawa et al.
patent: 2004/0237950 (2004-12-01), Metzelard
patent: 0 434 217 (1991-06-01), None
patent: 2 649 759 (1991-01-01), None
U.S. Appl. No. 12/593,482, filed Sep. 28, 2009, Agneray, et al.
U.S. Appl. No. 12/097,012, filed Jun. 11, 2008, Agneray, et al.
Agneray Andre
Couillaud Julien
Nouvel Clement
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Renault S.A.S.
Vu David Hung
LandOfFree
Optimization of the excitation frequency of a resonator does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Optimization of the excitation frequency of a resonator, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optimization of the excitation frequency of a resonator will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2656249