Optimization of multiple feature lithography

Details Optimization of multiple feature lithography Optimization of multiple feature lithography

2008-06-10

2008-06-10

Bella, Matthew C. (Department: 2624)

Image analysis

Image enhancement or restoration

C257SE21023, C257SE21206, C257SE21240

Reexamination Certificate

active

07386182

ABSTRACT:
According to one embodiment of the invention, a method for enhancing multiple feature lithography is provided. The method includes generating a plurality of maps each associated with a particular one of a plurality of circuit features. Each map maps an illumination field comprising a plurality of point sources and indicates, in terms of a process metric and for each point source, a level of feature quality that will result from using the each point source to image the each circuit feature. The method also includes identifying, based on the maps, a group of one or more of the point sources that, if used to image the circuit features onto a target surface, will result in an overall feature quality level equal to or greater than a predetermined quality threshold.

REFERENCES:
patent: 5835227 (1998-11-01), Grodnensky et al.
patent: 2004/0096752 (2004-05-01), Liebmann et al.
patent: 2004/0156030 (2004-08-01), Hansen

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