Optics for extreme ultraviolet lithography

Details Optics for extreme ultraviolet lithography Optics for extreme ultraviolet lithography

2006-07-18

2006-07-18

Wells, Nikita (Department: 2881)

Radiant energy

Invisible radiant energy responsive electric signalling

With or including a luminophor

C250S50400H, C250S461100, C250S370090

Reexamination Certificate

active

07078700

ABSTRACT:
According to an embodiment of the invention, extreme ultraviolet (EUV) photolithography is performed using lobster eye transmission optics. A light source, such as a source plasma, is located at the center of a circle. Several mirror segments are arranged on an arc of the circle. The mirror segments may be arranged so that the light generated by the light source is collimated after being reflected. The light source may be a source plasma capable of generating EUV photons.

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