Optically monitoring the thickness of a depositing layer

Details Optically monitoring the thickness of a depositing layer Optically monitoring the thickness of a depositing layer

1977-12-19

1979-02-27

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156659, 156662, 356138, 356357, 427 10, H01L 21306

Patent

active

041417801

ABSTRACT:
A method of optically monitoring the thickness of a layer of material being deposited on a substrate within a reaction chamber comprises forming on a body a diffraction grating profile, exposing the grating profile to a beam of light while depositing the material on both the substrate and the grating profile, whereby the grating profile functions as a relief pattern diffracting the light beam into diffracted beams of various orders, measuring the intensity of the first order (I.sub.1) and second order (I.sub.2) beams to obtain a ratio signal (I.sub.2 /I.sub.1), and then transmitting the ratio signal to processing means for determining the aspect groove width of the relief pattern, whereby the thickness of the depositing layer is determined from a pre-established relationship dependent upon the aspect groove width.

REFERENCES:
patent: 3211570 (1965-10-01), Salisbury
patent: 4039370 (1977-08-01), Kleinknecht
patent: 4073964 (1978-02-01), Herrmann

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