Optical wafer presence sensor system

Details Optical wafer presence sensor system Optical wafer presence sensor system

2005-09-27

2005-09-27

Font, Frank G. (Department: 2877)

Optics: measuring and testing

Photometers

Photoelectric

C356S237200

Reexamination Certificate

active

06950181

ABSTRACT:
A wafer presence optical sensor system comprises a transfer chamber adapted to receive a wafer, an optical sensor comprising means emitting a sensing beam and means receiving a beam reflected from the wafer to ascertain wafer presence in the chamber, and means to reflect away the sensing beam when reaching a chamber bottom. The reflecting means includes an oblique area made in an inner surface of the chamber bottom or, alternatively, a body with an oblique area placed on the inner surface. Reflecting away the sensing beam when no wafer is present in the transfer chamber prevents the receiving means from receiving the beam reflected from the chamber bottom and thus thwarts the misinterpretation of wafer presence.

REFERENCES:
patent: 4636073 (1987-01-01), Williams
patent: 5267217 (1993-11-01), Tokura et al.
patent: 5563798 (1996-10-01), Berken et al.
patent: 5598345 (1997-01-01), Tokura
patent: 6493086 (2002-12-01), McAndrew et al.

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