Optical system of a microlithographic projection exposure...

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07733501

ABSTRACT:
In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements.

REFERENCES:
patent: 3418052 (1968-12-01), Hoffmann
patent: 4022532 (1977-05-01), Montagnino
patent: 4303341 (1981-12-01), Kleinknecht et al.
patent: 4536086 (1985-08-01), Shemwell
patent: 4725144 (1988-02-01), Nelson
patent: 5142132 (1992-08-01), MacDonald et al.
patent: 5260761 (1993-11-01), Barker
patent: 5467191 (1995-11-01), Kishner
patent: 5477393 (1995-12-01), Sasaki et al.
patent: 5748323 (1998-05-01), Levinson
patent: 5757505 (1998-05-01), Mizutani
patent: 5784164 (1998-07-01), Deck et al.
patent: 5793473 (1998-08-01), Koyama et al.
patent: 5805273 (1998-09-01), Unno
patent: 6040909 (2000-03-01), Hasegawa et al.
patent: 6154279 (2000-11-01), Thayer
patent: 6262792 (2001-07-01), Higashiki
patent: 6293027 (2001-09-01), Elliott et al.
patent: 6388823 (2002-05-01), Gaber et al.
patent: 6417916 (2002-07-01), Dengler et al.
patent: 6717679 (2004-04-01), Kuchel
patent: 6775007 (2004-08-01), Izatt et al.
patent: 6784977 (2004-08-01), von Bunau et al.
patent: 6842255 (2005-01-01), Ohsaki et al.
patent: 7423765 (2008-09-01), Tschischgale et al.
patent: 2003/0003023 (2003-01-01), Korpela
patent: 2003/0234993 (2003-12-01), Hazelton
patent: 2005/0170748 (2005-08-01), Enkisch et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Optical system of a microlithographic projection exposure... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical system of a microlithographic projection exposure..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical system of a microlithographic projection exposure... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4239894

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.