Optical system, in particular illumination system, of a...

Details Optical system, in particular illumination system, of a... Optical system, in particular illumination system, of a...

2008-07-29

2008-07-29

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C359S857000

Reexamination Certificate

active

07405808

ABSTRACT:
An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.

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patent: 2001/0052968 (2001-12-01), Shiozawa
patent: 102 29 614 (2002-06-01), None
Roger Rymps, article entitled “Diagnostic Laser Beam Measurement,” Photonics Spectra, published Nov. 2003, pp. 50-53.

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